NEOARK代理 维尔克斯光电供应磁光测量系统 磁光克尔效应测量仪 磁光测试仪器
NEOARK代理 维尔克斯光电供应磁光测量系统 磁光克尔效应测量仪 磁光测试仪器。维尔克斯光电专业代理NEOARK磁光测量系统，磁光克尔效应测量仪，Magneto-Optical Product。磁光测量主要包括磁光克尔效应测量（μ-Kerr Effect）、磁滞回线测量和法拉第效应测量。日本NEOARK公司成立于1976年，是一家专业从事精密仪器仪表、激光器的高科技公司，在磁光测试领域拥有雄厚的技术实力。Neoark公司 产品产品范围包括：激光光源，激光测量（激光扫描仪、激光光谱分析仪、功率计、激光探测器），激光打标，位移测量仪，振动仪，激光微处理器，激光直接光刻系统，磁光/偏振特性测量等。其中以碘稳频激光器和磁光测量仪器最为出名。维尔克斯光电专业代理NEOARK磁光测量仪器在中国市场的销售。请联系NEOARK中国代理商 维尔克斯光电，刘经理 136 9191-6712, www.welloptics.cn磁光效应测量系统 Magneto-Optical Effect Measurement System关键词：磁光克尔效应磁滞回线测量：极性克尔效应（垂直磁化）纵向克尔效应（平面磁化）克尔效应测量显微镜低温法拉第效应测量垂直磁各向异性分析（磁场应用的角度依赖性）在平面磁各向异性分析（磁场应用的角度依赖性）在平面的倾斜角度评价 磁域观测显微镜（Kerr显微镜，磁光克尔效应显微镜）应用：显微镜磁域观察极克尔效应（垂直磁化）纵向克尔效应（平面磁化）低温 磁光效应测量系统关键词：磁滞回线测量晶圆磁记忆硬盘磁头磁传感器硬盘垂直磁记录介质软衬层（SUL）头装置热辅助磁记录（HAMR）硬盘媒体 μ-Kerr Effect Measurement And Magnetic Domain Observation SystemBH-PI7892 Series μ-Kerr Effect Measurement SystemBH-PI920 SeriesFeaturesMicroscopic Local Magnetic Property Analysis based onboth Polar and Longitudinal Kerr Effect(Not simultaneous measurement)Suitable for sensitive analysis of μm size magnetic pattern and magnetic thin filmSpecificationMeasurement Subject: Magneto-Optical Kerr Effect(Polar and Longitudinal Kerr Effect) Main Function: Kerr Loop MeasurementLight Source: Diode LaserProbe Light Spot: φ2-5μmGenerating Magnetic Field: Max. ±10kOe (1T)*Option: In-Plane Electromagnet μ-Kerr Effect Measurement and Magnetic Domain Observation SystemBH-PI7892 Series μ-Kerr Effect Measurement and Magnetic Domain Observation SystemBH-PI7892 Series Longitudinal Kerr Effect Measurement SystemBH-618 Series Faraday Effect Measurement SystemBH-620 Series Perpendicular Magnetic Anisotropy AnalysisFeaturesMagneto-Optical Kerr Effect with motorized rotating Electromagnetfor Magnetic Field Applied Angle Dependence Analysis In-Plane Magnetic Anisotropy & Skew Angle Analysis*Magnetic Field Application Angle Dependence Analysis(Magnetic Field Application Direction: In-Plane Direction) “For Wafer” Perpendicular Magnetic Layer Evaluation SystemModel: BH-810CPC25WF12FeaturesSpecially Designed for evaluation of Perpendicular Magnetic Layer of 12 Inch WaferSpecificationMain Function: Kerr Loop Measurement and Mapping Measurement(Polar Kerr Effect)Light Source: Diode LaserProbe Light Spot Size: φ1mm (Typ.)Generating Magnetic Field: Max. ± 25Oe (2.5T) “For Wafer” In-Plane Magnetic Layer Evaluation System Model: BH-618SK-12 “For Hard Disc” Perpendicular Magnetic Recording Layer Evaluation SystemModel: BH-810CPC “For Hard Disc” Soft Under Layer (SUL) Evaluation SystemModel: BH-618HSFeatures: Specially Designed for evaluation of Soft Under Layer (SUL) of both 2.5 inchand 3.5 Inch Hard Disk Magnetic Domain Observation MicroscopeBH-786 SeriesFeaturesMagnetic Domain Observation Microscope (Kerr Microscope) with various optionalmagnification and magnetic fieldSpecificationObservation Subject: Magneto-Optical Kerr Effect(Polar and Longitudinal Kerr Effect)Main Function: CCD Camera Observation and Image CapturingLight Source: Mercury LampObservation Resolution: 1μm (Typ.) with x50 Objective LensObservation Area: 100 x 70μm with x50 Objective LensGenerating Magnetic Field: > ± 10kOe (1T)*Option: In-Plane Electromagnet and Others Low Temperature Magnetic Domain Observation MicroscopeBH-7850 Series
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